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Plasma etching for CMOS device realization /

Plasma etching for CMOS device realization / edited by Nicolas Posseme - UK : Elsevier, 2017. - x, 121 pages : illustrations ; 24 cm. - Electronics engineering .

Includes bibliographical references.

ISBN: 9781785480966 (hbk)

Subjects--Topical Terms:
Metal oxide semiconductors, Complementary--Design and construction.
Plasma etching.
Metal oxide semiconductors, Complementary--Design and construction.
Plasma etching.

Dewey Class. No.: 621.39732 / POS/P

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