TY  - BOOK
AU  - Posseme,Nicolas
TI  - Plasma etching for CMOS device realization
T2  - Electronics engineering
SN  - 9781785480966  (hbk)
U1  - 621.39732 
PY  - 2017///
CY  - UK
PB  - Elsevier
KW  - Metal oxide semiconductors, Complementary
KW  - Design and construction
KW  - Plasma etching
N1  - Includes bibliographical references
ER  -