Plasma etching for CMOS device realization / 
edited by Nicolas Posseme 
 - UK :  Elsevier,  2017. 
 - x, 121 pages :  illustrations ;  24 cm. 
 - Electronics engineering .
<br/><br/>Includes bibliographical references. 
<br/><br/><label>ISBN: </label>9781785480966  (hbk) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Metal oxide semiconductors, Complementary--Design and construction.<br/>Plasma etching.<br/>Metal oxide semiconductors, Complementary--Design and construction.<br/>Plasma etching.
<br/><br/><label>Dewey Class. No.: </label>621.39732  / POS/P